مبانی لایه نشانی شیمیایی بخار (CVD)

Fundamentals of Chemical Vapor Deposition

مبانی لایه نشانی شیمیایی بخار (CVD)

ABSTRACT

Chemical vapor deposition is a synthesis process in which the chemical constituents react in the vapor phase near or on a heated substrate to form a solid deposit. The CVD technology combines several scientific and engineering disciplines including thermody- namics, plasma physics, kinetics, fluid dynamics, and of course chemistry. In this chapter, the fundamental aspects of these disci-plines and their relationship will be examined as they relate to CVD.

 

رشد نانولوله‌های کربنی روی فیبرهای کربنی توسط CVD حرارتی

Growth of Carbon Nanotubes on Carbon Fiber by

Thermal CVD Using Ni Nanoparticles as Catalysts

رشد نانولوله‌های کربنی روی فیبرهای کربنی توسط CVD حرارتی

با استفاده از نانوذرات نیکل به عنوان کاتالیزور

ABSTRACT

Nickel nanoparticles and thin film on carbon fiber have been prepared through electroless deposition. Moreover, carbon nanotubes were grown on carbon fiber covered by nickel nanoparticles using thermal chemical vapor deposition. The effects of changes in the thickness of the nickel catalyst layer and the growth temperature of carbon nanotubes were studied systemically, and the results are discussed in the present work.