مبانی لایه نشانی شیمیایی بخار (CVD)

Fundamentals of Chemical Vapor Deposition

مبانی لایه نشانی شیمیایی بخار (CVD)

ABSTRACT

Chemical vapor deposition is a synthesis process in which the chemical constituents react in the vapor phase near or on a heated substrate to form a solid deposit. The CVD technology combines several scientific and engineering disciplines including thermody- namics, plasma physics, kinetics, fluid dynamics, and of course chemistry. In this chapter, the fundamental aspects of these disci-plines and their relationship will be examined as they relate to CVD.